i-line 365nm wavelength

I-Line like G-line is not chemically amplified.  It relies on a photo activated compound to diffuse in the post exposure bake (PEB) step, however a PEB may not be necessary if enough PAC is in the resist film.

Choose us at Photolithography.net for any of the following and more:

• Photoresist coating optimization
• Photoresist changing and process characterization
• Photoresist use reduction (RRC)
• HMDS use optimization
• Critical Dimension Uniformity (CDU) optimization.  CDU should typically be less than 1% of feature size 1 sigma.
• Developer use for CD control
• Scanner to track throughput matching
• Defect investigations